A general approach to semimetallic, ultra-high-resolution, electron-beam resists

Advanced Functional Materials

Volumn 19, Issue 9, 2009, Pages 1437-1443

  Zong, Bao Yu ^a   Han, Gu Chang ^a   Zheng, Yuan Kai ^a   An, Li Hua ^a   Liu, Tie ^a   Li, Ke Bin ^a   Qiu, Jin Jun ^a   Guo, Zai Bing ^a   Luo, Ping ^a   Wang, Hao Min ^a   Liu, Bo ^a  

^a DATA STORAGE INSTITUTE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DRY-ETCHING RESISTANCE; ELECTRON BEAM RESIST; GENERAL APPROACH; HIGH QUALITY; ION BEAM ETCHING; METAL NANOPARTICLES; NANO PATTERN; NANO-DEVICES; PATTERN TRANSFERRING; ULTRA-HIGH;

ETCHING;

EID: 66149127288     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.200800939     Document Type: Article

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