SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 98, Issue , 2012, Pages 552-555

Fullerene-based spin-on-carbon hardmask

(4) Frommhold, A a Manyam, J a Palmer, R E a Robinson, A P G a

a UNIVERSITY OF BIRMINGHAM (United Kingdom)

Author keywords

Fullerene; Hardmask; ICP; Silicon etching; Spin on carbon

Indexed keywords

CARBON LAYERS; CRITICAL LAYER; FEATURE SIZES; HARDMASKS; HIGH ANISOTROPY; HIGH ASPECT RATIO; ICP; OXYGEN PLASMAS; PHOTORESIST FILM; SILICON ETCHING; SILICON SUBSTRATES; SPIN-ON; THIN SILICON FILMS; TRILAYERS;

ASPECT RATIO; CARBON FILMS; PHOTORESISTS; PLASMA ETCHING; SULFUR HEXAFLUORIDE;

FULLERENES;

EID: 84865597247 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2012.07.019 Document Type: Conference Paper

Times cited : (18)

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- Irresistible Materials Ltd., available from: < http://www. irresistiblematerials.com.

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