Thermal chemistry of Cu(I)-iminopyrrolidinate and Cu(I)-guanidinate atomic layer deposition (ALD) precursors on Ni(110) single-crystal surfaces

Chemistry of Materials

Volumn 25, Issue 18, 2013, Pages 3630-3639

  Kim, Taeseung ^a   Yao, Yunxi ^a   Coyle, Jason P ^b   Barry, Seán T ^b   Zaera, Francisco ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b CARLETON UNIVERSITY   (Canada)

Author keywords

amidinate complexes; atomic layer deposition; copper films; guanidinate complexes; surface chemistry; temperature programmed desorption; X ray photoelectron spectroscopy

Indexed keywords

ALD PRECURSOR; AMIDINATES; COPPER FILMS; DISSOCIATIVE ADSORPTION; GUANIDINATES; HYDRIDE ELIMINATION; OXIDATION STATE; THERMAL CHEMISTRY;

ATOMIC LAYER DEPOSITION; DEPOSITION; DIMERS; ETHYLENE; NICKEL; PHOTOELECTRONS; SURFACE CHEMISTRY; SURFACE REACTIONS; TEMPERATURE PROGRAMMED DESORPTION; X RAY PHOTOELECTRON SPECTROSCOPY;

IODINE;

EID: 84884832151     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm401707h     Document Type: Article

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