Implementation of atomic layer deposition in advanced semiconductor processes

ECS Transactions

Volumn 1, Issue 10, 2006, Pages 3-13

  Schaekers, M ^a   Van Ammel, A ^a   Travaly, Y ^a   Delabie, A ^a   Hoyas, A Martin ^a   Zhao, C ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; HAFNIUM COMPOUNDS; INSULATING MATERIALS; LEAKAGE CURRENTS; MOS DEVICES; TUNGSTEN COMPOUNDS;

HAFNIUM OXIDE; SEMICONDUCTOR PROCESSES; SURFACE SENSITIVITY;

THIN FILMS;

EID: 33846796419     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2209325     Document Type: Conference Paper

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