CVD of pure copper films from amidinate precursor

Electrochemical and Solid-State Letters

Volumn 14, Issue 3, 2011, Pages

  Krisyuk, Vladislav ^a,b   Aloui, Lyacine ^b   Prud'Homme, Natalie ^b   Sysoev, Sergey ^a   Senocq, Fraņois ^b   Saḿlor, Diane ^b   Vahlas, Constantin ^b  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^b INSTITUT CARNOT CIRIMAT   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMIDINATES; ATOMIC HYDROGEN; COPPER FILMS; CU BASED ALLOY; METALORGANIC CHEMICAL VAPOR DEPOSITION; PRECURSOR MOLECULES; PURE COPPER; REDUCING GAS; SI SUBSTRATES; TEMPERATURE RANGE; THERMAL DECOMPOSITIONS; TOTAL PRESSURE;

COPPER; COPPER ALLOYS; HYDROGEN; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; ORGANOMETALLICS; PYROLYSIS; REACTION KINETICS; SILICON COMPOUNDS; SILICON OXIDES; SURFACE REACTIONS;

ALUMINUM COATINGS;

EID: 78951490653     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3526142     Document Type: Article

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