Preventing thermolysis: Precursor design for volatile copper compounds

Chemical Communications

Volumn 48, Issue 84, 2012, Pages 10440-10442

  Coyle, Jason P ^a   Kurek, Agnieszka ^a   Pallister, Peter J ^a   Sirianni, Eric R ^b   Yap, Glenn P A ^b   Barry, Seán T ^a   Sun, Zhong Ming ^b  

^a CARLETON UNIVERSITY   (Canada)

^b UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER DERIVATIVE; COPPER TERT BUTYL IMINO 2,2 DIMETHYLPYRROLIDINATE; CUPROUS ION; UNCLASSIFIED DRUG; VOLATILE AGENT;

ARTICLE; CONTROLLED STUDY; DECOMPOSITION; PROTON NUCLEAR MAGNETIC RESONANCE; SURFACE PROPERTY; THERMOGRAVIMETRY; THERMOSTABILITY;

EID: 84866887468     PISSN: 13597345     EISSN: 1364548X     Source Type: Journal    
DOI: 10.1039/c2cc35415b     Document Type: Article

References (11)

1. M. Ritala and M. Leskelä, in Handbook of Thin Film Materials, ed. H. S. Nalwa, Vol. 1, Academic Press, San Diego, CA, 2001, pp. 103–156
2. M. Ritala, M. Leskelä, Thin Solid Films, 2002, 409, 138
3. H. Kim, J. Vac. Sci. Technol. B, 2003, 21, 2231
4. P. Dopplet, Coord. Chem. Rev, 1998, 178–180, 1785
5. F. T. Edelmann, Chem. Soc. Rev, 2012, DOI: 10.1039/C2CS35180C
6. Z. Li, A. Rahtu, A. R. G. Gordon, J. Electrochem. Soc, 2006, 153, C787
7. J. P. Coyle, W. H. Monillas, G. P. A. Yap, S. T. Barry, Inorg. Chem, 2008, 47, 683
8. J. P. Coyle, P. A. Johnson, G. A. DiLabio, S. T. Barry, J. Muller, Inorg. Chem, 2010, 49, 2844
9. A. M. Willcocks, T. P. Robinson, C. Roche, T. Pugh, S. P. Richards, A. J. Kingsley, J. P. Lowe, A. L. Johnson, Inorg. Chem, 2012, 51, 246
10. Q. Ma, H. Guo, R. G. Gordon, F. Zaera, Chem. Mater, 2011, 23, 3325
11. U. Beckmann, E. Eichberger, M. Lindner, M. Bongartz, P. C. Kunz, Eur. J. Org. Chem, 2008, 4139