A study on the metal-organic CVD of pure copper films from low cost copper(II) dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by small variations of the ligand

Chemical Vapor Deposition

Volumn 9, Issue 3, 2003, Pages 149-156

  Becker, Ralf ^a   Devi, Anjana ^a   Weiß, Jurij ^a   Weckenmann, Ulrike ^a   Winter, Manuela ^a   Kiener, Christoph ^b   Becker, Hans Werner ^a   Fischer, Roland A ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b MAX PLANCK INSTITUT FÜR KOHLENFORSCHUNG   (Germany)

Author keywords

Amino alkoxides; Copper; MOCVD; Thermal analysis; Thin films

Indexed keywords

CRYSTAL ORIENTATION; DEPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROELECTRONIC PROCESSING; PYROLYSIS; THERMOANALYSIS; THERMODYNAMIC PROPERTIES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

AMINO ALKOXIDES; LIGANDS; MICROELECTRONIC INDUSTRY; STRESS MIGRATION;

COPPER COMPOUNDS;

EID: 4544373668     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200306236     Document Type: Article

References (19)

1. T. T Kodas, M. J. Hampden-Smith, The Chemistry of Metal CVD, VCH, Weinheim 1994.
2. S. P. Murarka. Mater Sci. Eng. 1997, 79, 76.
3. J. Rickerby, J. H. G Steinke, Chem. Rev. 2002, 102, 1525.
4. E. S. Choi, S. K Park, H. K. Shin, H. H. Lee, Appl. Phys. Lett. 1996, 68, 1017.
5. P. M. Jeffries, G. S. Girolami. Chem. Mater. 1989, 7, 8.
6. V. L Young, D. F Cox, M. E. Davis. Chem. Mater. 1993, 5, 1701.
7. P.-F. Hsu, Y. Chi, T.-W. Lin, C. S. Liu, A. J Carty, S.-M. Peng, Chem. Vap. Deposition 2001, 7, 28.
8. S. C. Goel, K. S. Kramer, M. Y. Chiang, W. E Buhro, Polyhedron 1990, 9, 611.
9. R. Becker, J. Weiss, A. Devi, R. A. Fischer, J. Phys. IV2001. 11, 569.
10. R. Becker, J. Weiss, M. Winter, K. Merz, R. A. Fischer, J. Organomet. Chem. 2001, 630, 253.
11. J. Hambrock, R. Becker, A. Birkner, J. Weiss, R. A. Fischer, Chem. Commun. 2002, 68.
12. R Rittner, J. A. Vanin, B. Wladislaw, Magn. Reson. Chem 1988, 26, 51.
13. K.-K. Choi, S.-W. Rhee, Thin Solid Films 2001, 397, 70.
14. M. J. Attardo R Rosenberg. J. Appl. Phys. 1970, 41, 2381.
15. R Becker, Ph.D Thesis, Ruhr-Universitat Bochum 2003.
16. K.-K Choi. S.-W. Rhee, J. Eletrochem. Soc. 2001, 148, C473
17. J V. Singh, B. P. Baranwal, R. C. Mehrotra, Z. Anorg Allg. Chem. 1981, 477, 235.
18. S. C. Goel, W E. Buhro. Inorg. Synth. 1997, 37, 294.
19. E. Kotai, Nucl. Instrum. Methods Phys. Res. 1994, B 85, 588.