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Journal of Materials Science and Technology

Volumn 29, Issue 10, 2013, Pages 929-936

Optical and Microstructural Characterisations of Pulsed rf Magnetron Sputtered Alumina Thin Film

(6) Neelakanta Reddy, I a,b Rajagopal Reddy, V b Sridhara, N a Basavaraja, S c Sharma, A K a Dey, Arjun a

a INDIAN SPACE RESEARCH ORGANISATION (India)

b SRI VENKATESWARA UNIVERSITY (India)

c JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH (India)

Author keywords

Alumina; Infrared emissivity; Microstructure; Reflectance; Rf magnetron sputtering; Thin film; Transmittance

Indexed keywords

ENERGY DISPERSIVE X RAY SPECTROSCOPY; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; INFRARED EMISSIVITY; INFRARED EMITTANCE; REACTIVE SPUTTERING PROCESS; RF-MAGNETRON SPUTTERING; TRANSMITTANCE; TRANSMITTANCE AND REFLECTANCES;

ATOMIC FORCE MICROSCOPY; DEPOSITION; FIELD EMISSION MICROSCOPES; MAGNETRON SPUTTERING; MICROSTRUCTURE; OPTICAL FILMS; QUARTZ; REFLECTION; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TOPOGRAPHY; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

ALUMINA;

EID: 84883446988 PISSN: 10050302 EISSN: None Source Type: Journal
DOI: 10.1016/j.jmst.2013.05.002 Document Type: Article

Times cited : (23)

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