Influence of residual water on magnetron sputter deposited crystalline Al2O3 thin films

Thin Solid Films

Volumn 516, Issue 12, 2008, Pages 3877-3883

  Wallin, E ^a   Andersson, J M ^a   Lattemann, M ^a   Helmersson, U ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

Aluminum oxide; Phase formation; Sputtering; Water

Indexed keywords

ALUMINUM COMPOUNDS; MAGNETRON SPUTTERING; THIN FILMS; WATER;

ALUMINUM OXIDE; PHASE FORMATION;

CRYSTALLINE MATERIALS;

EID: 40749100541     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.135     Document Type: Article

References (26)

1. See, e.g. Gitzen W.H. Alumina as a Ceramic Material (1970), The American Ceramic Society, Westerville 173
2. Levin I., and Brandon D. J. Am. Ceram. Soc. 81 (1998) 1995
3. Ruppi S. Int. J. Refract. Met. Hard Mater. 23 (2005) 306
4. Skogsmo J., Halvarsson M., and Vuorinen S. Surf. Coat. Technol. 54/55 (1992) 186
5. Schneider J.M., Sproul W.D., Voevodin A.A., and Matthews A. J. Vac. Sci. Technol., A, Vac. Surf. Films 15 (1997) 1084
6. Zywitzki O., Hoetzsch G., Fietzke F., and Goedicke K. Surf. Coat. Technol. 82 (1996) 169
7. Brill R., Koch F., Mazurelle J., Levchuk D., Balden M., Yamada-Takamura Y., Maier H., and Bolt H. Surf. Coat. Technol. 174/175 (2003) 606
8. Rosén J., Mráz S., Kreissig U., Music D., and Schneider J.M. Plasma Chem. Plasma Process. 25 (2005) 303
9. Jin P., Xu G., Tazawa M., Yoshimura K., Music D., Alami J., and Helmersson U. J. Vac. Sci. Technol., A, Vac. Surf. Films 20 (2002) 2134
10. Andersson J.M., Czigány Zs., Jin P., and Helmersson U. J. Vac. Sci. Technol., A, Vac. Surf. Films 22 (2004) 117
11. Andersson J.M., Wallin E., Helmersson U., Kreissig U., and Münger E.P. Thin Solid Films 513 (2006) 57
12. Andersson J.M., Wallin E., Münger E.P., and Helmersson U. J. Appl. Phys. 100 (2006) 033305
13. Schneider J.M., Larsson K., Lu J., Olsson E., and Hjörvarsson B. Appl. Phys. Lett. 80 (2002) 1144
14. Schneider J.M., Anders A., Hjörvarsson B., Petrov I., Macák K., Helmersson U., and Sundgren J.-E. Appl. Phys. Lett. 74 (1999) 200
15. Tominaga K., Murayama T., Sato Y., and Mori I. Thin Solid Films 343-344 (1999) 81
16. Joint Committee on Powder Diffraction Standards (JCPDS), International Centre for Diffraction Data, Newtown Square, PA, U.S.A., card no. 29-0063.
17. Joint Committee on Powder Diffraction Standards (JCPDS), International Centre for Diffraction Data, Newtown Square, PA, U.S.A., card no. 46-1212.
18. Joint Committee on Powder Diffraction Standards (JCPDS), International Centre for Diffraction Data, Newtown Square, PA, U.S.A., card no. 38-1479.
19. Kay E., Parmigiani F., and Parrish W. J. Vac. Sci. Technol., A, Vac. Surf. Films 6 (1988) 3074
20. Kappertz O., Drese R., Ngaruiya J.M., and Wuttig M. Thin Solid Films 484 (2005) 64
21. Petrov I., Orlinov V., and Misiuk A. Thin Solid Films 120 (1984) 55
22. Selinder T.I., Larsson G., Helmersson U., and Rudner S. J. Appl. Phys. 69 (1991) 390
23. Wallin E., Andersson J.M., Münger E.P., Chirita V., and Helmersson U. Phys. Rev., B 74 (2006) 125409
24. Petrov I., Hultman L., Helmersson U., Sundgren J.-E., and Greene J.E. Thin Solid Films 169 (1989) 299
25. We assume the change in ionization degree to be negligible as water is introduced.
26. Rosén J., Widenkvist E., Larsson K., Kreissig U., Mráz S., Martinez C., Music D., and Schneider J.M. Appl. Phys. Lett. 88 (2006) 191905