Electrical properties of thin rf sputtered aluminum oxide films

Materials Science and Engineering: B

Volumn 109, Issue 1-3, 2004, Pages 99-103

  Voigt, M ^a   Sokolowski, M ^a  

^a UNIVERSITY OF BONN   (Germany)

Author keywords

Aluminum oxide; Electrical properties; Rf magnetron; Sputtered films

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; CAPACITORS; ELECTRIC BREAKDOWN; ELECTRODES; EVAPORATION; INSULATING MATERIALS; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; PERMITTIVITY;

IMPEDANCE SPECTRA; RADIO FREQUENCY MAGNETRON; THIN FILM CAPACITORS;

THIN FILMS;

EID: 2342460329     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2003.10.056     Document Type: Conference Paper

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