Surface roughness of alumina films deposited by reactive r.f. sputtering

Thin Solid Films

Volumn 286, Issue 1-2, 1996, Pages 45-48

  Zhao, Yadun ^a   Qian, Yitai ^a   Yu, Weichao ^a   Chen, Zuyao ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Alumina films; Sputtering deposition; Surface roughness

Indexed keywords

ALUMINA; AMORPHOUS FILMS; NANOSTRUCTURED MATERIALS; SPUTTER DEPOSITION; SURFACE ROUGHNESS;

GAS PRESSURE; SILICON SUBSTRATES;

THIN FILMS;

EID: 0030233682     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(95)08514-9     Document Type: Article

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