On the structural and optical characteristics of zinc telluride thin films

Journal of Optoelectronics and Advanced Materials

Volumn 8, Issue 3, 2006, Pages 922-926

  Rusu, G I ^a   Prepelita P ^a   Rusu, R S ^a   Apetroaie, N ^a   Oniciuc, G ^a   Amariei, A ^a  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

Author keywords

Absorption spectra; Microstructural parameters; Thin films; Zinc telluride

Indexed keywords

ABSORPTION SPECTRA; ATOMIC FORCE MICROSCOPY; CRYSTALLITE SIZE; DEPOSITION; II-VI SEMICONDUCTORS; LIGHT ABSORPTION; OPTICAL LATTICES; OPTICAL PROPERTIES; SUBSTRATES; TELLURIUM COMPOUNDS; VACUUM EVAPORATION; X RAY DIFFRACTION; ZINC COMPOUNDS; ZINC METALLOGRAPHY; ZINC SULFIDE;

BAND-TO-BAND TRANSITION; CRYSTALLINE STRUCTURE; DEPOSITION CONDITIONS; MICROSTRUCTURAL PARAMETERS; OPTICAL CHARACTERISTICS; POSTDEPOSITION HEAT TREATMENT; STRUCTURAL AND OPTICAL PROPERTIES; ZINC TELLURIDES;

THIN FILMS;

EID: 33745923222     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (30)

1. M. Jain (Ed), II-VI Semiconductor Compounds, World Scientific, Singapore, (1993).
2. R. Bhargava (Ed), Properties of Wide Bandgap II-VI Semiconductors, Inspec. London (1997).
3. A. Rohatgi, R. Sudharsanan, S. A. Ringel, Sol.Cells. 27, 566 (1978).
4. P. K. Kalita, B. K. Sarma, H. L. Das, Ind. J. Pure and Appl. Phys. 37, 885 (1999).
5. A. K. S. Aqili, Z. Ali, A. Mazsood, Appl. Surf. Sci. 167, 1 (2000).
6. M. R. H. Khan, J. Phys D Appl. Phys. 27, 2190 (1994).
7. W. I. Tao, M. Jurkovic, I. N. Wang, Appl. Phys. Lett. 64, 1848 (1994).
8. G. I. Rusu, P. Prepeliţǎ, N. Apetroaei, G. Popa, J. Optoelectron. Adv. Mater. 7, 829 (2005).
9. T. Mahalingam, V. S. John, G. Ravi, P. J. Sebastian, Surf. Coat. Technol. 155, 245 (2002).
10. H. Bellakhder, A. Outzourhit, E. L. Ameziane, Thin Solid Films 382, 20 (2001).
11. T. Ishizaki, T. Ohmoto, A. Fuwa, J. Phys. D: Appl. Phys. 37, 255 (2004).
12. G. G. Rusu, M. Rusu, Solid State Commun. 116, 363 (2000).
13. G. I. Rusu, M. E. Popa, G. G. Rusu, I. Salaoru, Appl. Surf. Sci. 218, 222 (2003).
14. K. L. Chopra, Thin Film Phenomena, McGraw- Hill, New York(1969).
15. M. Rusu, I. Salaoru, M. E. Popa, G. I. Rusu, Intern. J. Mod. Phys. B18, 1287 (2004).
16. R. S. Rusu, G. I. Rusu, J. Optoelectron. Adv. Mater 7, 823, (2005).
17. G. I. Rusu, I. Caplanus, L. Leontie, A. Airinei, E. Butuc, D. Mardare, I. I. Rusu, Acta.Mater. 49, 553 (2001).
18. J. N. Hodgson, Optical Absorption and Dispersion in Solids, Chapman & Hall, London (1970).
19. B. D. Cullity, Elements of X-ray Diffraction, Addison-Wesley, Reading, Massachusetts 356, (1979).
20. P. E. Y. Flewitt, R. K. Wild, Physical Methods for Material Characterization, IOP Publishing Ltd, London, 1994.
21. N. Tigau, V. Ciupina, G. Prodan, G. I. Rusu, E. Vasile, J. Cryst. Growth, 269, 392 (2004).
22. L. L. Kazmerski (Ed), Polycrystalline and Amorphous thin Films and Devices, Academic Press, New York (1980).
23. C. Baban, Y. Toyoda, M. Ogita, J. Optoelectron. Adv. Mater. 7, .891, (2005).
24. M. Rusu, Appl. Phys.A 66, 357 (1998)
25. R. Swanepoel, J. Phys. E Sci. Instrum. 16, 121 (1983);
26. R. Swanepoel, J. Phys. E Sci. Instrum. 17, 896 (1984).
27. J. C. Manifacier, J. Gasiot, J. P. Filiard, L. Vicario, Thin Solid Films 41, 127 (1977);
28. J. C. Manifacier, J. Gasiot, J. P. Filiard, L. Vicario, Thin Solid Films 37, 329 (2002).
29. K. Seeger, Semiconductor Physics, Springer, Berlin, Heidelberg-New-York, 1999
30. M. Nishiq, K. Hayashida, Q. Guo, H. Ogawa, Appl. Surf. Sci. 169/170, 223 (2001).