Electron beam-physical vapor deposition of SiC/SiO 2 high emissivity thin film

Applied Surface Science

Volumn 253, Issue 9, 2007, Pages 4361-4366

  Yi, Jian ^a   He, XiaoDong ^a   Sun, Yue ^a   Li, Yao ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

EB PVD; High emissivity; SiC; SiO 2; Thermal protection

Indexed keywords

ELECTRON BEAMS; ENERGY DISPERSIVE SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH TEMPERATURE EFFECTS; PHYSICAL VAPOR DEPOSITION; SILICA; SILICON CARBIDE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON BEAM PHYSICAL VAPOR DEPOSITION (EBPVD); ELECTRON PROBE MICROANALYSIS (EPMA); GRAZING INCIDENCE X RAY ASYMMETRY DIFFRACTION (GIAXD); THERMAL PROTECTION;

THIN FILMS;

EID: 33846798237     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.09.063     Document Type: Article

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