Directed evolution of α-grains in thin metastable-Al2O3 films deposited on Si(100) after post-deposition annealing

Thin Solid Films

Volumn 518, Issue 15, 2010, Pages 4304-4311

  Lee, Sung Bo ^a   Ahn, Chi Won ^b   Lee, Sang Hoon ^a   Her, Eun Kyu ^a   Oh, Kyu Hwan ^a   Kim, Doh Yeon ^a   Lee, Dong Nyung ^a  

^a Seoul National University   (South Korea)

^b National Nano Fab Center (NNFC)   (South Korea)

Author keywords

Al2O3; Cutting tools; Films; Plasticity; X ray methods

Indexed keywords

AL2O3; ALUMINA FILMS; DIRECTED EVOLUTION; DISLOCATION PITS; MATRIX; PHASE TRANSFORMATION; POST DEPOSITION ANNEALING; RADIO-FREQUENCY-MAGNETRON SPUTTERING; SI SUBSTRATES; SI(1 0 0); SILICON SUBSTRATES; STRESS DISTRIBUTION; SUBSTRATE SURFACE; THERMAL EXPANSION COEFFICIENTS; TWIN PLANES; X RAY METHODS;

ALUMINUM; MACHINE TOOLS; METAL WORKING TOOLS; PLASTICITY; SILICON; STRESS CONCENTRATION; SUBSTRATES; SURFACE DEFECTS; THERMAL EXPANSION; X RAY ANALYSIS;

CUTTING TOOLS;

EID: 77953130232     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.01.011     Document Type: Article

References (32)

1. Levin I., and Brandon D. J. Am. Ceram. Soc. 81 (1998) 1995
2. Kingery W.D., Bowen H.K., and Uhlmann D.R. Introduction to Ceramics. 2nd ed. (1976), John Wiley & Sons, New York
3. Lux B., Colombier C., Altena H., and Stjernberg K. Thin Solid Films 138 (1986) 49
4. Skogsmo J., Halvarsson M., and Vuorinen S. Surf. Coat. Technol. 54-55 (1992) 186
5. Zywitzki O., and Hoetzsch G. Surf. Coat. Technol. 86-87 (1996) 640
6. Larsson A., Halvarsson M., and Vuorinen S. Surf. Coat. Technol. 94-95 (1997) 76
7. Müller J., Schierling M., Zimmermann E., and Neuschütz D. Surf. Coat. Technol. 120-121 (1999) 16
8. Taymaz I., Mimaroglu A., Avci{dotless} E., Uçar V., and Gur M. Surf. Coat. Technol. 116-119 (1999) 690
9. Kundu M., Miyata N., and Ichikawa M. Appl. Phys. Lett. 78 (2001) 1517
10. Oliver W.C., and Pharr G.M. J. Mater. Res. 7 (1992) 1564
11. French R.H. J. Am. Ceram. Soc. 73 (1990) 477
12. Frieser R.G. J. Electrochem. Soc. 113 (1966) 357
13. Dragoo A.L., and Diamond J.J. J. Am. Ceram. Soc. 50 (1967) 568
14. Chou T.C., and Nieh T.G. J. Am. Ceram. Soc. 74 (1991) 2270
15. Rehwald W., and Vonlanthen A. Semicond. Sci. Technol. 1 (1986) 280
16. Yoriume Y. J. Electrochem. Soc. 129 (1982) 2076
17. Wu W.W., He J.H., Cheng S.L., Lee S.W., and Chen L.J. Appl. Phys. Lett. 83 (2003) 1836
18. Xie Y.H., Samavedam S.B., Bulsara M., Langdo T.A., and Fitzgerald E.A. Appl. Phys. Lett. 71 (1997) 3567
19. McHale J.M., Auroux A., Perrotta A.J., and Navrotsky A. Science 277 5327 (1997) 788
20. Yanagita H., and Yamaguchi G. Bull. Chem. Soc. Jpn. 37 (1964) 1229
21. Okada Y., and Tokumaru Y. J. Appl. Phys. 56 (1984) 314
22. Goto T., Anderson O.L., Ohno I., and Yamamoto S. J. Geophys. Res. 94 B6 (1989) 7588
23. Janssen G.C.A.M., Abdalla M.M., van Keulen F., Pujada B.R., and van Venrooy B. Thin Solid Films 517 (2009) 1858
24. Ohta H., Miura H., and Kitano M. Fatigue Fract. Eng. Mater. Struct. 24 (2001) 877
25. Hu S.M. J. Appl. Phys. 49 (1978) 5678
26. Hu S.M. Appl. Phys. Lett. 31 (1977) 139
27. Churchman A.T., Geach G.A., and Winton J. Proc. Roy. Soc. Lond. Ser. A 238 (1956) 194
28. Franks J., Geach G.A., and Churchman A.T. Proc. Phys. Soc. 68 (1955) 111
29. Chama C.C. J. Mater. Sci. Lett. 17 (1998) 1857
30. Lee D.N. Adv. Mater. Res. 26-28 (2007) 623
31. Choi J.-H., Kim D.-Y., Hockey B.J., Wiederhorn S.M., Handwerker C.A., Blendell J.E., Carter W.C., and Roosen A.R. J. Am. Ceram. Soc. 80 (1997) 62
32. Gieske J.H., and Barsch G.R. Phys. Status Solidi 29 (1968) 121