Influence of substrates on the structural and morphological properties of RF sputtered ITO thin films for photovoltaic application

Thin Solid Films

Volumn 517, Issue 7, 2009, Pages 2324-2327

  Manavizadeh, Negin ^a,b   Boroumand, Farhad Akbari ^a   Asl Soleimani, Ebrahim ^b   Raissi, Farshid ^a   Bagherzadeh, Sheida ^b   Khodayari, Alireza ^b   Rasouli, Mohammad Amin ^a  

^a K N TOOSI UNIVERSITY OF TECHNOLOGY   (Iran)

^b UNIVERSITY OF TEHRAN   (Iran)

Author keywords

Annealing in vacuum; ITO thin films; Mono and multicrystalline; RF sputtering; Structural and morphological properties

Indexed keywords

GLASS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; THIN FILMS; THREE DIMENSIONAL; VACUUM; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS;

ANNEALING IN VACUUM; ITO THIN FILMS; MONO AND MULTICRYSTALLINE; RF SPUTTERING; STRUCTURAL AND MORPHOLOGICAL PROPERTIES;

STRUCTURAL PROPERTIES;

EID: 58949096503     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.11.027     Document Type: Article

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