Different techniques of alumina film deposition

Chinese Optics Letters

Volumn 8, Issue SUPPL., 2010, Pages 83-86

  Zhao, Zhihong ^a   Ji, Yiqin ^a   Liu, Dandan ^a   Zong, Jie ^a  

^a TIANJIN JINHANG INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALPHA ALUMINA; ALUMINA FILMS; CRYSTALLINE PHASE; ELECTRON BEAM EVAPORATION; GAMMA ALUMINA; GAMMA PHASE; HIGH REFRACTIVE INDEX; ION-BEAM SPUTTERING; SINGLE LAYER; SUBSTRATE SURFACE; ULTRAVIOLET ABSORPTION;

ELECTRON BEAMS; ION BEAMS; MICROSTRUCTURE; REFRACTIVE INDEX; SPUTTERING; SURFACE ROUGHNESS;

AMORPHOUS FILMS;

EID: 77953258021     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: 10.3788/COL201008S1.0083     Document Type: Article

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