Nanocrystalline γ-Al2O3 thin film deposited by magnetron sputtering (MS) at low temperature

Journal of Coatings Technology and Research

Volumn 7, Issue 4, 2010, Pages 515-519

  Carradò, Adele ^a   Taha, Mohamed A ^b   El Mahallawy, Nahed A ^b  

^a INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

^b Ain Shams University   (Egypt)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; AMORPHOUS FILMS; AMORPHOUS MATERIALS; HARDNESS; MAGNETRON SPUTTERING; NANOCRYSTALS; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; THIN FILMS;

304L STAINLESS STEEL; ARGON PLASMAS; DEPOSITION PARAMETERS; HARDNESS VALUES; LOW TEMPERATURES; METAL SURFACES; NANOCRYSTALLINES; POLYCRYSTALLINE STRUCTURE;

ALUMINUM OXIDE;

EID: 77954953248     PISSN: 15470091     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11998-009-9198-9     Document Type: Article

References (19)

1. Fabre, A, Pelletier, H, Duriez, D, Barrallier, L, Grigorescu, S, Faerber, J, Schmerber, G, Versini, G, Carradò, A, Presses Polytechniques et Universitaires Romandes, EPFL (2009) (in press)
2. Cloud, AN, Canovic, S, Abu-Safe, H, Gordon, MH, Halvarsson, M, "TEM Investigation of Alpha Alumina Films Deposited at Low Temperature." Surf. Coat. Technol., 203 (5-7) 808-811 (2008)
3. Schneider, JM, Sproul, WD, Matthews, A, "Phase Formation and Mechanical Properties of Alumina Coatings Prepared at Substrate Temperatures less than 500°C by Ionised and Conventional Sputtering." Surf. Coat. Technol., 94-95 179-183 (1997)
4. Wolfe, GJ, Petrowsky, CJ, Quito, DT, "The Role of hard Coatings in Carbid Milling Tools." J. Vac. Sci. Technol. A, 4 2747 (1986)
5. 2 Coatings." Surf. Coat. Technol., 154 (2) 182-188 (2002)
6. Li, Q, Yu, YH, Bhatia, CS, Marks, LD, Lee, SC, Chung, YW, "Low-Temperature Magnetron Sputter-Deposition, Hardness and Electrical Resistivity of Amorphous and Crystalline Alumina Thin Films." J. Vac. Sci. Technol. A, 18 (5) 2333-2338 (2000)
7. Kamoshida, M, Mitchell, IV, Mayer, JW, "Influence of Deposition Temperature on Properties of Hydrolytically Grown Aluminum Oxide Films." Appl. Phys. Lett., 18 292 (1971)
8. 2 System." Jpn. J. Appl. Phys., 11 840-849 (1972)
9. 3 Films and Their Hardness." Surf. Coat. Technol., 202 920-924 (2007)
10. 3 Layers Reactively Deposited by Means of Pulsed Magnetron Sputtering." Surf. Coat. Technol., 86-87 640-647 (1996) (Pubitemid 126405641)
11. 3 Layers by Means of Bipolar Pulsed Magnetron Sputtering." Surf. Coat. Technol., 86-87 657-663 (1996)
12. Schneider, JM, Sproul, WD, Voevodin, AA, Matthews, A, "Crystalline Alumina Deposited at Low Temperatures by Ionized Magnetron Sputtering." J. Vac. Sci. Technol. A, 5 (3) 1084-1088 (1997)
13. Schneider, JM, Sproul, WD, Matthews, A, "Reactive Ionized Magnetron Sputtering of Crystalline Alumina Coatings." Surf. Coat. Technol., 98 1473 (1998)
14. Khanna, A, Bhat, DG, "Nanocrystalline Gamma Alumina Coatings by Inverted Cylindrical Magnetron Sputtering." Surf. Coat. Technol., 201 168-173 (2006)
15. Rutherford, KL, Hutchings, IM, Bull, SJ, Doyle, ED, "Laboratory Characterisation of the Wear Behaviour of PVD-Coated Tool Steels and Correlation with Cutting Tool Performance." Surf. Coat. Technol., 80 (1) 176-180 (1996)
16. Rossi, S, Fedrizzi, L, Leoni, M, Scardi, P, Massian, Y, " (Ti, Cr) N and Ti/TiN PVD Coatings on 304 Stainless Steel Substrates: Wear-Corrosion Behaviour." Thin Solid Films, 15 161-167 (1999)
17. Rutherford, KL, Hutchings, IM, "Micro-Scale Abrasive Wear Resistance of PVD Coatings on Curved Substrates." Tribol. Lett., 2 (1) 1-11 (1996)
18. 3 Coatings by Pulsed DC PACVD." Surf. Coat. Technol., 116-119 891-897 (1999)
19. Schetze, A, Quinto, DT, "Pulsed Plasma-Assisted PVD Sputter-Deposited Alumina Thin Films." Surf. Coat. Technol., 162 174-182 (2007)