Formation process of Al2O3 thin film by reactive sputtering

Vacuum

Volumn 83, Issue 3, 2008, Pages 483-485

  Chiba, Y ^a   Abe, Y ^a   Kawamura, M ^a   Sasaki, K ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Aluminum oxide; Gettering effect; Plasma emission intensity; Reactive sputtering; Target voltage

Indexed keywords

ALUMINUM OXIDE; FORMATION PROCESSES; GETTERING EFFECT; PLASMA EMISSION INTENSITY; REACTIVE SPUTTERING; TARGET VOLTAGE;

ALUMINUM;

EID: 52949111878     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.04.012     Document Type: Article

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