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Thin Solid Films

Volumn 339, Issue 1-2, 1999, Pages 240-248

Properties of aluminium oxide thin films deposited by reactive magnetron sputtering

(3) Koski, Kari a,b Hölsä, Jorma b Juliet, Pierre a

a CEA GRENOBLE (France)

b UNIVERSITY OF TURKU (Finland)

Author keywords

Aluminium oxide; Properties; Reactive magnetron sputtering

Indexed keywords

ALUMINUM COMPOUNDS; CRYSTAL STRUCTURE; ELASTIC MODULI; MAGNETRON SPUTTERING; OXIDATION; OXYGEN; RESIDUAL STRESSES; SILICON; STOICHIOMETRY; SUBSTRATES; SURFACE ROUGHNESS;

ALUMINUM OXIDE;

AMORPHOUS FILMS;

EID: 0033534984 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)01232-2 Document Type: Article

Times cited : (122)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.