Deposition of aluminium oxide thin films by reactive magnetron sputtering

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 716-720

  Koski, K ^a,b   Holsa J ^a   Juliet, P ^b  

^a UNIVERSITY OF TURKU   (Finland)

^b CEA GRENOBLE   (France)

Author keywords

Aluminium oxide; Deposition rate; Physical properties; Reactive sputtering

Indexed keywords

ALUMINUM COMPOUNDS; CRYSTAL MICROSTRUCTURE; MAGNETRON SPUTTERING; MICROHARDNESS; STOICHIOMETRY; SURFACE ROUGHNESS; THIN FILMS;

ALUMINUM OXIDE THIN FILMS; REACTIVE SPUTTERING;

SPUTTER DEPOSITION;

EID: 0033338962     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00087-0     Document Type: Article

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