Phase formation and mechanical properties of alumina coatings prepared at substrate temperatures less than 500°C by ionized and conventional sputtering

Surface and Coatings Technology

Volumn 94-95, Issue , 1997, Pages 179-183

  Schneider, Jochen M ^a   Sproul, William D ^a,c   Matthews, Allan ^b  

^a NORTHWESTERN UNIVERSITY   (United States)

^b UNIVERSITY OF HULL   (United Kingdom)

^c Sputtered Films Inc   (United States)

Author keywords

Alumina coatings; Ionized sputtering; Substrate temperature

Indexed keywords

ALUMINA; AMORPHOUS FILMS; FILM GROWTH; HARDENING; MAGNETRON SPUTTERING; PHASE TRANSITIONS; STAINLESS STEEL; SUBSTRATES; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

ALUMINA COATINGS; CONVENTIONAL REACTIVE MAGNETRON SPUTTERING (CMS); IONIZED REACTIVE MAGNETRON SPUTTERING (IMS);

PROTECTIVE COATINGS;

EID: 0343603227     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0257-8972(97)00437-4     Document Type: Article

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