Electrical performance of alumina thin films for high-temperature pressure cells with a metallic body

IEEE Sensors Journal

Volumn 10, Issue 5, 2010, Pages 918-923

  Fricke, Sören ^a,b   Friedberger, Alois ^b   Müller, Gerhard ^b   Brode, Wolfgang ^c   Seidel, Helmut ^a   Schmid, Ulrich ^d  

^a SAARLAND UNIVERSITY   (Germany)

^b AIRBUS GROUP INNOVATIONS   (Germany)

^c Siegert Thinfilm Technology GmbH   (Germany)

^d VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Al2O3; Alumina; Harsh environment; High temperature; Metallic; Pressure; Sensor; Sputterdeposition; Superalloy; Thin film

Indexed keywords

ALUMINA FILMS; ALUMINA THIN FILMS; DIELECTRIC PERFORMANCE; ELECTRICAL PERFORMANCE; HARSH ENVIRONMENT; HIGH TEMPERATURE; IV CHARACTERISTICS; METALLIC; NICKEL- BASED SUPERALLOYS; OPERATING TEMPERATURE; PRESSURE CELL; SILICON SUBSTRATES; SUBSTRATE CONDITIONS; SUBSTRATE MATERIAL; SUBSTRATE QUALITY; TARGET APPLICATION; TEMPERATURE DEPENDENCE;

ALUMINA; DIELECTRIC FILMS; METAL FINISHING; NICKEL ALLOYS; OPTICAL FILMS; PRESSURE SENSORS; PRESSURE TRANSDUCERS; SUPERALLOYS; THIN FILM DEVICES; THIN FILMS;

SUBSTRATES;

EID: 77950240235     PISSN: 1530437X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSEN.2009.2036447     Document Type: Article

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