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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 2, 2013, Pages

Ion flux and ion distribution function measurements in synchronously pulsed inductively coupled plasmas

(6) Brihoum, Melisa a Cunge, Gilles a Darnon, Maxime a Gahan, David b Joubert, Olivier a Braithwaite, Nicholas St J c

a Laboratoire Interdisciplinaire de Physique (France)

b Woodford Business Park (Ireland)

c OPEN UNIVERSITY (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PLASMAS; CAPACITIVELY COUPLED PLASMAS; CONTINUOUS WAVES; ENERGETIC ION; INDUCTIVELY COUPLED RF PLASMA; ION DISTRIBUTIONS; ION ENERGIES; ION FLUXES; LOW DENSITY; LOW FLUX; OPERATING RANGES; PLASMA CHEMISTRIES; PULSED PLASMA; RF PULSE; STEADY-STATE VALUES; TIME-AVERAGED;

CHEMICAL BONDS; CHUCKS; DISTRIBUTION FUNCTIONS; ELECTROMAGNETIC INDUCTION; ELECTRONEGATIVITY; INDUCTIVELY COUPLED PLASMA; PLASMA ETCHING;

IONS;

EID: 84874602832 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.4790364 Document Type: Article

Times cited : (30)

References (33)

1
- 84863636560
- 10.1116/1.4716176
- S. Banna, A. Agarwal, G. Cunge, M. Darnon, E. Pargon, and O. Joubert, J. Vac. Sci. Technol. A 30, 040801 (2012). 10.1116/1.4716176
- (2012) J. Vac. Sci. Technol. A , vol.30 , pp. 040801
- Banna, S.¹ Agarwal, A.² Cunge, G.³ Darnon, M.⁴ Pargon, E.⁵ Joubert, O.⁶

2
- 70349437193
- 10.1109/TPS.2009.2028071
- S. Banna, IEEE Trans. Plasma Sci. 37, 1730 (2009). 10.1109/TPS.2009. 2028071
- (2009) IEEE Trans. Plasma Sci. , vol.37 , pp. 1730
- Banna, S.¹

3
- 79952014920
- 10.1116/1.3521315
- A. Agarwal, P. Stout, S. Banna, S. Rauf, and J. Collins, J. Vac. Sci. Technol. A 29, 11017 (2011). 10.1116/1.3521315
- (2011) J. Vac. Sci. Technol. A , vol.29 , pp. 11017
- Agarwal, A.¹ Stout, P.² Banna, S.³ Rauf, S.⁴ Collins, J.⁵

4
- 71749107534
- 10.1063/1.3262616
- A. Agarwal, P. Stout, S. Banna, S. Rauf, K. Tokashiki, J.-Y. Lee, and K. Collins, J. Appl. Phys. 106, 103305 (2009). 10.1063/1.3262616
- (2009) J. Appl. Phys. , vol.106 , pp. 103305
- Agarwal, A.¹ Stout, P.² Banna, S.³ Rauf, S.⁴ Tokashiki, K.⁵ Lee, J.-Y.⁶ Collins, K.⁷

5
- 79952014920
- 10.1116/1.3521315
- A. Agarwal, P. J. Stout, S. Banna, S. Rauf, and K. Collins, J. Vac. Sci. Technol. A 29, 011017 (2011). 10.1116/1.3521315
- (2011) J. Vac. Sci. Technol. A , vol.29 , pp. 011017
- Agarwal, A.¹ Stout, P.J.² Banna, S.³ Rauf, S.⁴ Collins, K.⁵

6
- 84856487122
- 10.1063/1.3679075
- A. Agarwal, P. J. Stout, S. Banna, S. Rauf, and K. Collins, Appl. Phys. Lett. 100, 044105 (2012). 10.1063/1.3679075
- (2012) Appl. Phys. Lett. , vol.100 , pp. 044105
- Agarwal, A.¹ Stout, P.J.² Banna, S.³ Rauf, S.⁴ Collins, K.⁵

7
- 71749107534
- 10.1063/1.3262616
- A. Agarwal, P. J. Stout, S. Banna, S. Rauf, K. Tokashiki, J. Y. Lee, and K. Collins, J. Appl. Phys. 106, 103305 (2009). 10.1063/1.3262616
- (2009) J. Appl. Phys. , vol.106 , pp. 103305
- Agarwal, A.¹ Stout, P.J.² Banna, S.³ Rauf, S.⁴ Tokashiki, K.⁵ Lee, J.Y.⁶ Collins, K.⁷

8
- 0035473564
- 10.1063/1.1406139
- P. Subramonium and M. J. Kushner, Appl. Phys. Lett. 79, 2145 (2001). 10.1063/1.1406139
- (2001) Appl. Phys. Lett. , vol.79 , pp. 2145
- Subramonium, P.¹ Kushner, M.J.²

9
- 77957723719
- 10.1116/1.3483165
- C. Petit-Etienne, M. Darnon, L. Vallier, E. Pargon, G. Cunge, F. Boulard, O. Joubert, S. Banna, and T. Lill, J. Vac. Sci. Technol. B 28, 926 (2010). 10.1116/1.3483165
- (2010) J. Vac. Sci. Technol. B , vol.28 , pp. 926
- Petit-Etienne, C.¹ Darnon, M.² Vallier, L.³ Pargon, E.⁴ Cunge, G.⁵ Boulard, F.⁶ Joubert, O.⁷ Banna, S.⁸ Lill, T.⁹

10
- 80053464751
- 10.1116/1.3622311
- C. Petit-Etienne, J. Vac. Sci. Technol. B 29, 51202 (2011). 10.1116/1.3622311
- (2011) J. Vac. Sci. Technol. B , vol.29 , pp. 51202
- Petit-Etienne, C.¹

11
- 84864233261
- 10.1116/1.4737125
- C. Petit-Etienne, E. Pargon, S. David, M. Darnon, L. Vallier, O. Joubert, and S. Banna, J. Vac. Sci. Technol. B 30, 040604 (2012). 10.1116/1.4737125
- (2012) J. Vac. Sci. Technol. B , vol.30 , pp. 040604
- Petit-Etienne, C.¹ Pargon, E.² David, S.³ Darnon, M.⁴ Vallier, L.⁵ Joubert, O.⁶ Banna, S.⁷

12
- 84859586437
- 10.1088/0963-0252/21/2/024006
- G. Cunge, P. Bodart, M. Brihoum, F. Boulard, T. Chevolleau, and N. Sadeghi, Plasma Sources Sci. Technol. 21, 024006 (2012). 10.1088/0963-0252/21/2/ 024006
- (2012) Plasma Sources Sci. Technol. , vol.21 , pp. 024006
- Cunge, G.¹ Bodart, P.² Brihoum, M.³ Boulard, F.⁴ Chevolleau, T.⁵ Sadeghi, N.⁶

13
- 84859357929
- 10.1063/1.3663443
- P. Bodart, M. Brihoum, G. Cunge, O. Joubert, and N. Sadeghi, J. Appl. Phys. 110, 113302 (2011). 10.1063/1.3663443
- (2011) J. Appl. Phys. , vol.110 , pp. 113302
- Bodart, P.¹ Brihoum, M.² Cunge, G.³ Joubert, O.⁴ Sadeghi, N.⁵

14
- 0000892949
- 10.1063/1.371447
- M. V. Malyshev, V. M. Donnelly, J. I. Colonell, and S. Samukawa, J. Appl. Phys. 86, 4813 (1999). 10.1063/1.371447
- (1999) J. Appl. Phys. , vol.86 , pp. 4813
- Malyshev, M.V.¹ Donnelly, V.M.² Colonell, J.I.³ Samukawa, S.⁴

15
- 0035425290
- 10.1063/1.1381044
- M. V. Malyshev and V. M. Donnelly, J. Appl. Phys. 90, 1130 (2001). 10.1063/1.1381044
- (2001) J. Appl. Phys. , vol.90 , pp. 1130
- Malyshev, M.V.¹ Donnelly, V.M.²

16
- 0036494097
- 2 pulsed plasmas
- DOI 10.1116/1.1434965
- P. Subramonium and M. J. Kushner, J. Vac. Sci. Technol. A 20, 325 (2002). 10.1116/1.1434965 (Pubitemid 34405097)
- (2002) Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films , vol.20 , Issue.2 , pp. 325-334
- Subramonium, P.¹ Kushner, M.J.²

17
- 0031071961
- 10.1143/JJAP.36.854
- S. Ashida and M. A. Lieberman, Jpn. J. Appl. Phys., Part 1 36, 854 (1997). 10.1143/JJAP.36.854
- (1997) Jpn. J. Appl. Phys., Part 1 , vol.36 , pp. 854
- Ashida, S.¹ Lieberman, M.A.²

18
- 77749255234
- 10.1088/0022-3727/43/11/115202
- E. G. Thorsteinsson and J. T. Gudmundsson, J. Phys. D: Appl. Phys. 43, 115202 (2010). 10.1088/0022-3727/43/11/115202
- (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 115202
- Thorsteinsson, E.G.¹ Gudmundsson, J.T.²

19
- 36849034839
- Broadband and time-resolved absorption spectroscopy with light emitting diodes: Application to etching plasma monitoring
- DOI 10.1063/1.2822448
- G. Cunge, D. Vempaire, M. Touzeau, and N. Sadeghi, Appl. Phys. Lett. 91, 231503 (2007). 10.1063/1.2822448 (Pubitemid 350234423)
- (2007) Applied Physics Letters , vol.91 , Issue.23 , pp. 231503
- Cunge, G.¹ Vempaire, D.² Touzeau, M.³ Sadeghi, N.⁴

20
- 77950501568
- 10.1063/1.3368124
- G. Cunge, D. Vempaire, and N. Sadeghi, Appl. Phys. Lett. 96, 131501 (2010). 10.1063/1.3368124
- (2010) Appl. Phys. Lett. , vol.96 , pp. 131501
- Cunge, G.¹ Vempaire, D.² Sadeghi, N.³

21
- 79952949677
- 10.1088/0022-3727/44/12/122001
- G. Cunge, M. Fouchier, M. Brihoum, P. Bodart, M. Touzeau, and N. Sadeghi, J. Phys. D: Appl. Phys. 44, 122001 (2010). 10.1088/0022-3727/44/12/122001
- (2010) J. Phys. D: Appl. Phys. , vol.44 , pp. 122001
- Cunge, G.¹ Fouchier, M.² Brihoum, M.³ Bodart, P.⁴ Touzeau, M.⁵ Sadeghi, N.⁶

22
- 41549090909
- Retarding field analyzer for ion energy distribution measurements at a radio-frequency biased electrode
- DOI 10.1063/1.2890100
- D. Gahan, B. Dolinaj, and M. B. Hopkins, Rev. Sci. Instrum. 79, 033502 (2008). 10.1063/1.2890100 (Pubitemid 351469748)
- (2008) Review of Scientific Instruments , vol.79 , Issue.3 , pp. 033502
- Gahan, D.¹ Dolinaj, B.² Hopkins, M.B.³

23
- 77954931467
- 10.1002/ppa200931607
- D. Gahan, B. Dolinaj, C. Hayden, and M. B. Hopkins, Plasma Processes Polym. 6, S643 (2009). 10.1002/ppap.200931607
- (2009) Plasma Processes Polym. , vol.6 , pp. 643
- Gahan, D.¹ Dolinaj, B.² Hayden, C.³ Hopkins, M.B.⁴

24
- 84859620908
- 10.1088/0963-0252/21/2/024004
- D. Gahan, S. Daniels, C. Hayden, P. Scullin, D. O'Sullivan, Y. T. Pei, and M. B. Hopkins, Plasma Sources Sci. Technol. 21, 024004 (2012). 10.1088/0963-0252/21/2/024004
- (2012) Plasma Sources Sci. Technol. , vol.21 , pp. 024004
- Gahan, D.¹ Daniels, S.² Hayden, C.³ Scullin, P.⁴ O'Sullivan, D.⁵ Pei, Y.T.⁶ Hopkins, M.B.⁷

25
- 0000080651
- 10.1063/1.1150681
- J. P. Booth, N. S. J. Braithwaite, A. Goodyear, and P. Barroy, Rev Sci. Instrum. 71, 2722 (2000). 10.1063/1.1150681
- (2000) Rev Sci. Instrum. , vol.71 , pp. 2722
- Booth, J.P.¹ Braithwaite, N.S.J.² Goodyear, A.³ Barroy, P.⁴

26
- 0030282058
- 10.1088/0963-0252/5/4/009
- N. S. J. Braithwaite, J. P. Booth, and G. Cunge, Plasma Sources Sci. Technol. 5, 677 (1996). 10.1088/0963-0252/5/4/009
- (1996) Plasma Sources Sci. Technol. , vol.5 , pp. 677
- Braithwaite, N.S.J.¹ Booth, J.P.² Cunge, G.³

27
- 3142694887
- 10.1063/1.1751636
- P. Subramonium and M. J. Kushner, J. Appl. Phys. 96, 82 (2004). 10.1063/1.1751636
- (2004) J. Appl. Phys. , vol.96 , pp. 82
- Subramonium, P.¹ Kushner, M.J.²

28
- 84858016045
- 10.1116/1.3679551
- P. Bodart, G. Cunge, O. Joubert, and T. Lill, J. Vac. Sci. Technol. A 30, 020602 (2012). 10.1116/1.3679551
- (2012) J. Vac. Sci. Technol. A , vol.30 , pp. 020602
- Bodart, P.¹ Cunge, G.² Joubert, O.³ Lill, T.⁴

29
- 0036026394
- 4 chemistries during silicon etching in industrial high-density plasmas
- DOI 10.1116/1.1511219
- G. Cunge, R. L. Inglebert, O. Joubert, L. Vallier, and N. Sadeghi, J. Vac. Sci. Technol. B 20, 2137 (2002). 10.1116/1.1511219 (Pubitemid 35354130)
- (2002) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.20 , Issue.5 , pp. 2137-2148
- Cunge, G.¹ Inglebert, R.L.² Joubert, O.³ Vallier, L.⁴ Sadeghi, N.⁵

30
- 0000072957
- 10.1088/0963-0252/9/3/314
- M. V. Malyshev and V. M. Donnelly, Plasma Sources Sci. Technol. 9, 353 (2000). 10.1088/0963-0252/9/3/314
- (2000) Plasma Sources Sci. Technol. , vol.9 , pp. 353
- Malyshev, M.V.¹ Donnelly, V.M.²

31
- 0030134012
- 10.1088/0963-0252/5/2/006
- M. A. Lieberman and S. Ashida, Plasma Sources Sci. Technol. 5, 145 (1996). 10.1088/0963-0252/5/2/006
- (1996) Plasma Sources Sci. Technol. , vol.5 , pp. 145
- Lieberman, M.A.¹ Ashida, S.²

32
- 84889416744
- (Wiley, New York).
- M. A. Lieberman and A. J. Lichtenberg, Principle of Plasma Discharges and Material Processing (Wiley, New York, 2005).
- (2005) Principle of Plasma Discharges and Material Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

33
- 70350637362
- 10.1088/0963-0252/18/4/045028
- E. Despiau-Pujo and P. Chabert, Plasma Sources Sci. Technol. 18, 045028 (2009). 10.1088/0963-0252/18/4/045028
- (2009) Plasma Sources Sci. Technol. , vol.18 , pp. 045028
- Despiau-Pujo, E.¹ Chabert, P.²

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