Dynamics of inductively-coupled pulsed chlorine plasmas in the presence of continuous substrate bias

Plasma Sources Science and Technology

Volumn 9, Issue 3, 2000, Pages 353-360

  Malyshev, M V ^a,b   Donnelly, V M ^a  

^a LUCENT TECHNOLOGIES   (United States)

^b MCKINSEY AND COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000072957     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/9/3/314     Document Type: Article

References (22)

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