Ion energy distribution measurements in rf and pulsed dc plasma discharges

Plasma Sources Science and Technology

Volumn 21, Issue 2, 2012, Pages

  Gahan, D ^a   Daniels, S ^b   Hayden, C ^b   Scullin, P ^a   O'Sullivan, D ^a   Pei, Y T ^c   Hopkins, M B ^a  

^a Woodford Business Park   (Ireland)

^b DUBLIN CITY UNIVERSITY   (Ireland)

^c UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL SOLUTIONS; ARGON DISCHARGES; CAPACITIVELY COUPLED; CIRCUIT MODELS; COLLISIONLESS; DEPOSITED FILMS; DISCHARGE POWER; ELECTRODE SURFACES; ELECTRON ENERGY DISTRIBUTIONS; ENERGY DISTRIBUTIONS; FLOATING SUBSTRATE; ION ENERGY DISTRIBUTIONS; LANGMUIR PROBE MEASUREMENTS; LOW PRESSURES; MAGNETRON POWER; MICROSTRUCTURE AND PROPERTIES; PARALLEL PLATES; PLASMA PARAMETER; PULSE PERIOD; PULSED DC MAGNETRON; PULSED DC PLASMA; RADIO FREQUENCIES; RADIO FREQUENCY SHEATH; TIME RESOLUTION; TIME-AVERAGED; TIME-RESOLVED;

ELECTRIC DISCHARGES; ELECTRIC POWER DISTRIBUTION; FILM GROWTH; IONS; PLASMA SHEATHS;

PLASMA SOURCES;

EID: 84859620908     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/21/2/024004     Document Type: Article

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