Chemical etching of zinc oxide for thin-film silicon solar cells

ChemPhysChem

Volumn 13, Issue 1, 2012, Pages 66-73

  Hüpkes, Jürgen ^a   Owen, Jorj I ^a   Pust, Sascha E ^a   Buntea ^a,b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b Euroglas GmbH SOLAR   (Germany)

Author keywords

electrochemistry; etching; interfaces; solar cells; zinc oxide

Indexed keywords

ELECTROCHEMISTRY; ETCHING; GRAIN BOUNDARIES; II-VI SEMICONDUCTORS; INTERFACES (MATERIALS); LIGHT SCATTERING; SOLAR CELLS; TEXTURES; THIN FILM SOLAR CELLS; THIN FILMS; ZINC OXIDE;

CHEMICAL ETCHING; DEPOSITED ZINCS; DEPOSITION CONDITIONS; ETCHING AGENTS; ETCHING BEHAVIOR; ETCHING SOLUTIONS; ETCHING STEP; THIN-FILM SILICON SOLAR CELLS;

SILICON SOLAR CELLS;

EID: 84855679760     PISSN: 14394235     EISSN: 14397641     Source Type: Journal    
DOI: 10.1002/cphc.201100738     Document Type: Article

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