Pretreatment of glass substrates by Ar/O2 ion beams for the as-sputtered rough Al doped zinc oxide thin films

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Zhang, Wendi ^a   Bunte, Eerke ^a   Luysberg, Martina ^a   Spiekermann, Philipp ^a   Ruske, Florian ^b   Hüpkes, Jürgen ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

As grown rough films; Crystal orientation; Ion beam pretreatment; ZnO:Al films

Indexed keywords

AL-DOPED ZINC OXIDE; AS-GROWN; AS-GROWN ROUGH FILMS; COLUMNAR GRAIN; GLASS SUBSTRATES; GROWTH DIRECTIONS; HCL SOLUTION; IN-PLANE ORIENTATION; LARGE-GRAIN; LIGHT-TRAPPING; OUT-OF-PLANE TEXTURES; PRE-TREATMENT; SELECTED AREA DIFFRACTION PATTERNS; SILICON THIN FILM; SUBSTRATE SURFACE; TEXTURED SURFACE; WELL-ALIGNED; ZNO; ZNO:AL FILMS;

BEAM PLASMA INTERACTIONS; CRYSTAL ORIENTATION; DIFFRACTION; GLASS; HYDROCHLORIC ACID; ION BEAMS; ION BOMBARDMENT; IONS; MAGNETRONS; METALLIC FILMS; OXIDE FILMS; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ALUMINUM;

EID: 79959806567     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.01.018     Document Type: Article

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