Wet-chemical etching of (112̄0) ZnO films

Journal of Electronic Materials

Volumn 33, Issue 6, 2004, Pages 556-559

  Zhu, J ^a   Emanetoglu, N W ^a   Chen, Y ^a   Yakshinskiy, B V ^b   Lu, Y ^a  

^a RUTGERS UNIVERSITY   (United States)

^b RUTGERS UNIVERSITY   (United States)

Author keywords

Anisotropy; Etching mask; Wet chemical etching; zno

Indexed keywords

ACIDITY; ADHESION; ALUMINUM; ANISOTROPY; CHEMICAL VAPOR DEPOSITION; DIFFUSION; ETCHING; OPTICAL MICROSCOPY; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SCHOTTKY BARRIER DIODES; SPUTTERING; THERMAL EFFECTS; THIN FILMS; ULTRAVIOLET DETECTORS;

ETCHANTS; ETCHING CYCLES; ETCHING MASKS; WET CHEMICAL ETCHINGS;

ZINC OXIDE;

EID: 3042751898     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-004-0046-5     Document Type: Conference Paper

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