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Journal of Non-Crystalline Solids

Volumn 218, Issue , 1997, Pages 74-80

Optical and electrical properties of doped zinc oxide films prepared by ac reactive magnetron sputtering

(2) Szyszka, B a Jager S a

a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; COMPOSITION EFFECTS; ELECTRIC CONDUCTIVITY MEASUREMENT; INDIUM; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR DOPING; THIN FILMS; TRANSPARENCY; X RAY CRYSTALLOGRAPHY; ZINC OXIDE;

HALL MOBILITY; REACTIVE SPUTTERING;

SEMICONDUCTING FILMS;

EID: 0031549329 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(97)00288-3 Document Type: Article

Times cited : (52)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.