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Volumn 205, Issue 3, 2010, Pages 773-779

High rate reactive magnetron sputtering of ZnO:Al films from rotating metallic targets

Author keywords

Chemical etching; Reactive sputtering; Surface texture; ZnO:Al films

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; BEFORE AND AFTER; CHEMICAL ETCHING; DEPOSITION CONDITIONS; DISCHARGE POWER; ETCHED SURFACE; HIGH DYNAMIC; HIGH QUALITY; HIGH RATE; LIGHT-SCATTERING FILMS; METALLIC TARGETS; NEAR INFRARED REGION; REACTIVE MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE; SURFACE FEATURE; SURFACE TEXTURE; SURFACE TEXTURES; VISIBLE SPECTRAL RANGE; WORKING POINT; ZNO; ZNO:AL FILMS; ZNO:AL THIN FILMS;

EID: 77956650243     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.07.122     Document Type: Article
Times cited : (13)

References (24)
  • 4
    • 77956651759 scopus 로고    scopus 로고
    • Proceeding of 23rd European Photovoltaic Solar Energy Conference, 1-5 September, Valencia, Spain, VIP renewable energies
    • E. Bunte, H. B. Zhu, J. Hüpkes. Proceeding of 23rd European Photovoltaic Solar Energy Conference, 1-5 September 2008, Valencia, Spain, VIP renewable energies, p2105.
    • (2008) , pp. 2105
    • Bunte, E.1    Zhu, H.B.2    Hüpkes, J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.