Modified Thornton model for magnetron sputtered zinc oxide: Film structure and etching behaviour

Thin Solid Films

Volumn 442, Issue 1-2, 2003, Pages 80-85

  Kluth, Oliver ^a   Schöpe, Gunnar ^a   Hüpkes, Jürgen ^a   Agashe, Chitra ^a   Müller, Joachim ^a   Rech, Bernd ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Etching; Sputtering; Surface morphology; Zinc oxide

Indexed keywords

FILM GROWTH; MAGNETRON SPUTTERING; MORPHOLOGY; REACTIVE ION ETCHING; STRUCTURE (COMPOSITION); SUBSTRATES; ZINC OXIDE;

SPUTTER TECHNIQUES;

THIN FILMS;

EID: 0141748219     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00949-0     Document Type: Conference Paper

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