The relationship of etching behavior and crystal orientation of aluminum doped zinc oxide films

Applied Surface Science

Volumn 257, Issue 5, 2010, Pages 1420-1424

  Ding, J N ^a,b   Ye, F ^a,b   Yuan, N Y ^a,b   Tan, C B ^a,b   Zhu, Y Y ^a,b   Ding, G Q ^a,b   Chen, Z H ^a,b  

^a CHANGZHOU UNIVERSITY   (China)

^b Key Laboratory of New Energy Source   (China)

Author keywords

AZO film; Crystal orientation; Etching behavior; Magnetron sputtered

Indexed keywords

ALUMINUM COATINGS; ALUMINUM OXIDE; CONDUCTIVE FILMS; II-VI SEMICONDUCTORS; OPTICAL FILMS; OPTICAL PROPERTIES; SUBSTRATES; SURFACE MORPHOLOGY; TRANSPARENT CONDUCTING OXIDES; WET ETCHING; ZINC OXIDE;

ALUMINUM DOPED ZINC OXIDE FILMS; ALUMINUM-DOPED ZINC OXIDE; AZO FILMS; DOMINANT ORIENTATION; ELECTRICAL AND OPTICAL PROPERTIES; ETCHING BEHAVIOR; SUBSTRATE TEMPERATURE; TRANSPARENT CONDUCTING FILMS;

CRYSTAL ORIENTATION;

EID: 78049260055     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.08.054     Document Type: Article

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