Patterning of transparent conducting oxide thin films by wet etching for a-Si:H TFT-LCDs

Journal of Electronic Materials

Volumn 25, Issue 12, 1996, Pages 1806-1817

  Lan, Je Hsiung ^a   Kanicki, Jerzy ^a   Catalano, Anthony ^b   Keane, James ^b   Den Boer, Willem ^c   Gu, Tieer ^c  

^a UNIVERSITY OF MICHIGAN   (United States)

^b NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^c Optical Imaging Systems Inc   (United States)

Author keywords

Al doped zinc oxide; Etching; Films; Hydrogen containing plasma; Indium tin oxide

Indexed keywords

ELECTRIC CONDUCTIVITY; ETCHING; LIGHT TRANSMISSION; PLASMAS; THIN FILMS;

INDIUM TIN OXIDE;

ZINC OXIDE;

EID: 0030418865     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02657158     Document Type: Article

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