Aluminium doped zinc oxide sputtered from rotatable dual magnetrons for thin film silicon solar cells

Thin Solid Films

Volumn 517, Issue 10, 2009, Pages 3161-3166

  Zhu, H ^a,b   Bunte, E ^a   Hupkes J ^a   Siekmann, H ^a   Huang, S M ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b East China Normal University   (China)

Author keywords

Magnetron sputtering; Solar cells; Wet chemical etching; Zinc oxide

Indexed keywords

ALUMINUM; CERAMIC MATERIALS; FILM GROWTH; MAGNETRONS; METALLIC FILMS; MICROCRYSTALLINE SILICON; OPTICAL PROPERTIES; OXIDE FILMS; PHOTOVOLTAIC CELLS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SILICON SOLAR CELLS; SOLAR CELLS; SOLAR ENERGY; SUBSTRATES; SURFACE TOPOGRAPHY; TARGETS; ZINC; ZINC OXIDE;

CERAMIC TARGETS; DISCHARGE POWER; DUAL MAGNETRONS; ELECTRICAL AND OPTICAL PROPERTIES; FEATURE SIZES; FILM PROPERTIES; GAS FLOWS; GLASS SUBSTRATES; GROWTH MODELS; HIGH EFFICIENCIES; HIGH GROWTH RATES; LOW RESISTIVITIES; MICROCRYSTALLINE SILICON SOLAR CELLS; MID FREQUENCIES; RADIO FREQUENCIES; ROUGH SURFACES; SUBSTRATE TEMPERATURES; THIN-FILM SILICON SOLAR CELLS; WET-CHEMICAL ETCHING; WORKING PRESSURES; ZNO; ZNO:AL FILMS;

WET ETCHING;

EID: 61449113004     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.11.116     Document Type: Article

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