Novel texturing method for sputtered zinc oxide films prepared at high deposition rate from ceramic tube targets

EPJ Photovoltaics

Volumn 2, Issue , 2011, Pages

  Bunte, E ^a   Zhu, H ^a   Hupkes, J ^a   Owen, J ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COATINGS; ALUMINUM OXIDE; CERAMIC MATERIALS; CHLORINE COMPOUNDS; DEPOSITION RATES; FILM PREPARATION; HYDROCHLORIC ACID; HYDROFLUORIC ACID; II-VI SEMICONDUCTORS; OPTICAL FILMS; SILICON SOLAR CELLS; SOLAR CELLS; SUBSTRATES; TEXTURES; THIN FILMS; TRANSPARENT CONDUCTING OXIDES; WET ETCHING; ZINC OXIDE;

ALUMINUM DOPED ZINC OXIDES (ZNO:AL); CHEMICAL WET ETCHING; DILUTED HYDROFLUORIC ACIDS; HIGH DEPOSITION RATES; SILICON THIN-FILM SOLAR CELLS; SILICON-BASED THIN FILMS; SURFACE TEXTURES; ZINC OXIDE (ZNO);

THIN FILM SOLAR CELLS;

EID: 84894163444     PISSN: None     EISSN: 21050716     Source Type: Journal    
DOI: 10.1051/epjpv/2011004     Document Type: Article

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