High quality textured ZnO:Al surfaces obtained by a two-step wet-chemical etching method for applications in thin film silicon solar cells

Solar Energy Materials and Solar Cells

Volumn 95, Issue 8, 2011, Pages 2281-2286

  Fernandez S ^a   De Abril, O ^b   Naranjo, F B ^c   Gandia J J ^a  

^a CIEMAT   (Spain)

^b UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

^c UNIVERSITY OF ALCALÁ   (Spain)

Author keywords

RF sputtering; Scattering properties; Texture surfaces; ZnO:Al

Indexed keywords

II-VI SEMICONDUCTORS; LIGHT SCATTERING; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SILICON SOLAR CELLS; SOLAR CELLS; SURFACE SCATTERING; THIN FILM SOLAR CELLS; THIN FILMS; ZINC OXIDE;

COMMERCIAL SUBSTRATES; ELECTRICAL AND OPTICAL PROPERTIES; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-SPUTTERING; SCATTERING PROPERTY; THIN-FILM SILICON SOLAR CELLS; TWO-STEP ETCHING METHOD; ZNO:AL;

WET ETCHING;

EID: 79958112556     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2011.03.042     Document Type: Article

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