Investigation of textured Al-doped ZnO thin films using chemical wet-etching methods

Materials Chemistry and Physics

Volumn 127, Issue 1-2, 2011, Pages 358-363

  Lu, Wei Lun ^a   Huang, Kuo Chan ^a   Yeh, Chih Hung ^b   Hung, Chen I ^a   Houng, Mau Phon ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NexPower Technology Corporation   (Taiwan)

Author keywords

Atomic force microscopy (AFM); Etching; Light scattering; Thin films

Indexed keywords

ACID CONCENTRATIONS; AL-DOPED ZNO; AZO FILMS; ELECTRICAL RESISTIVITY; ETCHING METHOD; ETCHING TIME; FILM SURFACES; GLASS SUBSTRATES; RF-MAGNETRON SPUTTERING; SCATTERING PROPERTY; SILICON THIN FILM; ZNO:AL FILMS;

ALUMINUM; ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY; GLASS; LIGHT SCATTERING; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; REFRACTION; SCATTERING; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; THIN FILMS; ZINC OXIDE;

WET ETCHING;

EID: 79952987668     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2011.02.019     Document Type: Article

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