Electrochemical etching of zinc oxide for silicon thin film solar cell applications

Journal of the Electrochemical Society

Volumn 158, Issue 7, 2011, Pages

  Pust, Sascha E ^a   Becker, Jan Philipp ^a   Worbs, Janine ^a   Klemm, Sebastian O ^b   Mayrhofer, Karl J J ^b   Hpkes, Jrgen ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHING; ELECTROCHEMICAL ANODIZATIONS; ETCHING STEP; EXPERIMENTAL PARAMETERS; FOUR-POINT; HALL MEASUREMENTS; INTERFACIAL STRUCTURES; MICROCRYSTALLINE SI; SCATTERING PROPERTY; SILICON THIN FILM; SINGLE JUNCTION SOLAR CELLS; SYSTEMATIC VARIATION; THIN-FILM PHOTOVOLTAIC DEVICES; ZNO FILMS; ZNO:AL FILMS;

DISSOLUTION; ELECTROCHEMICAL PROPERTIES; FILM PREPARATION; METALLIC FILMS; MORPHOLOGY; OXIDE FILMS; PHOTOVOLTAIC EFFECTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SOLAR CELLS; SOLAR POWER GENERATION; SURFACE MORPHOLOGY; THIN FILMS; ZINC OXIDE;

ELECTROCHEMICAL ETCHING;

EID: 79957581740     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3583636     Document Type: Article

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