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Volumn 29, Issue 6, 2011, Pages

Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON BEAMS; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

EID: 84255184060     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3656027     Document Type: Article
Times cited : (15)

References (26)
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    • Approaching the resolution limit of nanometer-scale electron beam-induced deposition
    • DOI 10.1021/nl050522i
    • W. F. van Dorp, B. van Someren, C. W. Hagen, P. Kruit, and P. A. Crozier, Nano Lett. 5, 1303 (2005). 10.1021/nl050522i (Pubitemid 41084407)
    • (2005) Nano Letters , vol.5 , Issue.7 , pp. 1303-1307
    • Van Dorp, W.F.1    Van Someren, B.2    Hagen, C.W.3    Kruit, P.4    Crozier, P.A.5
  • 4
    • 49049094436 scopus 로고    scopus 로고
    • 10.1088/1468-6996/9/1/014110
    • K. Furuya, Sci. Technol. Adv. Mater. 9, 014110 (2008). 10.1088/1468-6996/9/1/014110
    • (2008) Sci. Technol. Adv. Mater. , vol.9 , pp. 014110
    • Furuya, K.1
  • 7
    • 0021696411 scopus 로고
    • Feasibility of multi-beam electron lithography
    • DOI 10.1016/0167-9317(84)90005-4
    • B. Roelofs and J. Barth, Microelectron. Eng. 2, 259 (1984). 10.1016/0167-9317(84)90005-4 (Pubitemid 15586977)
    • (1984) Microelectronic Engineering , vol.2 , Issue.4 , pp. 259-279
    • Roelofs, B.J.G.M.1    Barth, J.E.2
  • 26
    • 54149085000 scopus 로고    scopus 로고
    • 10.1016/j.phpro.2008.07.138
    • Y. Zhang and P. Kruit, Phys. Procedia 1, 553 (2008). 10.1016/j.phpro. 2008.07.138
    • (2008) Phys. Procedia , vol.1 , pp. 553
    • Zhang, Y.1    Kruit, P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.