Distributed, multiple variable shaped electron beam column for high throughput maskless lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3168-3173

  Groves, T R ^a   Kendall, R A ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001112962     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590458     Document Type: Article

References (13)

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