Preparatory Study for the Matrix-Pattern Imaging, EB System

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 10, 2003, Pages 6672-6677

  Tanimoto, Sayaka ^a   Someda, Yasuhiro ^a,b   Okumura, Masahide ^a   Ohta, Hiroya ^a   Sohda, Yasunari ^a   Saitou, Norio ^a,c  

^a HITACHI LTD   (Japan)

^b CANON INC   (Japan)

^c HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

Brightness; Electron beam lithography; Matrix pattern imaging; MIM; MPI

Indexed keywords

ABERRATIONS; ARRAYS; CATHODES; CURRENT DENSITY; ELECTRIC NETWORK ANALYSIS; ELECTRON BEAM LITHOGRAPHY; ELECTRON SOURCES; ILLUMINATING ENGINEERING;

CIRCUIT-PATTERN ELEMENTS; MATRIX-PATTERN IMAGING (MPI);

IMAGING TECHNIQUES;

EID: 0348219411     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.6672     Document Type: Article

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