Demonstration of multiblanker electron-beam technology

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3052-3056

  Winograd, G ^a,b   Krishnamurthi, V ^a   Garcia, R ^a   Veneklasen, L H ^a   Mankos, M ^a   Pease, F ^a,b  

^a APPLIED MATERIALS INC   (United States)

^b STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CROSSTALK; ELECTRIC FIELD EFFECTS; MASKS; SILICON WAFERS;

MULTIBLANKER CHIPS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034318562     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321757     Document Type: Article

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