Design of a high brightness multi-electron-beam source

Physics Procedia

Volumn 1, Issue 1, 2008, Pages 553-563

  Zhang, Yanxia ^a   Kruit, Pieter ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Aperture lens; Electron beam lithography and inspection system; Field curvature: Transverse chromatic aberrations; Multi beam system

Indexed keywords

EID: 54149085000     PISSN: 18753884     EISSN: 18753892     Source Type: Conference Proceeding    
DOI: 10.1016/j.phpro.2008.07.138     Document Type: Conference Paper

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