Feasibility study of multiple-beam scanning electron microscopy for defect inspection

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5570-5574

  Nakasuji, Mamoru ^a   Yoshikawa, Shoji ^a   Satake, Tohru ^a   Noji, Nobuharu ^a  

^a EBARA CORPORATION   (Japan)

Author keywords

Aberration; Brightness; Defect inspection; Emlttance; Multiple beam; Pixel frequency; Scanning electron microscopy; Secondary electron

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; ELECTRIC FIELDS; ELECTRODES;

BRIGHTNESS; DEFECT INSPECTION; MULTIPLE-BEAM; PIXEL FREQUENCY;

SCANNING ELECTRON MICROSCOPY;

EID: 31844447796     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5570     Document Type: Article

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