Optical properties of a multibeam column with a single-electron source

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 1, 2007, Pages 140-146

  Kamimura, Osamu ^a   Tanimoto, Sayaka ^a   Ohta, Hiroya ^a   Nakayama, Yoshinori ^a   Sakakibara, Makoto ^a   Sohda, Yasunari ^a   Muraki, Masato ^b   Gotoh, Susumu ^b   Hosoda, Masaki ^b   Someda, Yasuhiro ^b   Tamamori, Kenji ^b   Hirose, Futoshi ^b   Nagae, Kenichi ^b   Kato, Kazuhiko ^b   Okunuki, Masahiko ^b  

^a HITACHI LTD   (Japan)

^b CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; IMAGE PROCESSING; OPTICAL PROPERTIES; PROJECTION SYSTEMS; SEMICONDUCTOR DEVICES;

MULTIBEAM COLUMNS; MULTISOURCE MODULE (MSM); PROJECTION OPTICS;

ELECTRON SOURCES;

EID: 34047153464     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2429674     Document Type: Article

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