Progress toward a raster multibeam lithography tool

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 2, 2004, Pages 501-505

  Coyle, S T ^a   Shamoun, B ^a   Yu, M ^a   Maldonado, J ^a   Thomas, T ^b   Holmgren, D ^c   Chen, X ^c   Scheinfein, M R ^d   DeVore, B ^a   Gesley, M ^a  

^a APPLIED MATERIALS INC   (United States)

^b TKD Inc   (United States)

^c Applied Materials Company   (United States)

^d SIMON FRASER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; DATA REDUCTION; DEGASSING; ELECTRON BEAM LITHOGRAPHY; ELECTRON OPTICS; LASER BEAMS; LIGHT MODULATION; NOISE ABATEMENT; OPTICAL RESOLVING POWER; PHOTOCATHODES; PHOTOEMISSION; PHOTOMULTIPLIERS; SCANNING; SCINTILLATION;

BEAM-DELIVERY SUBSYSTEMS; ELECTRON OPTICAL COULUMNS; FULL WIDTH HALF MAXIMUM (FWHM); LASER BEAM PATTERNING;

LASER OPTICS;

EID: 2342634505     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1645885     Document Type: Article

References (7)

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4. S. T. Coyle et al., J. Vac. Sci. Technol. B 20, 2657 (2002).
5. V. Chakarian et al., Proc. SPIE 4186, 1 (2001).
6. M. Angelopoulos (unpublished, 2000).
7. Munro's Electron Beam Software Ltd., London, U.K.