New concept for high-throughput multielectron beam direct write system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3061-3066

  Muraki, Masato ^a   Gotoh, Susumu ^a  

^a CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MICROELECTROMECHANICAL DEVICES; MICROOPTICS; OPTICAL INSTRUMENT LENSES; OPTICAL SYSTEMS; SILICON WAFERS;

CORRECTION LENS ARRAY (CLA); MULTIELECTRON BEAM DIRECT WRITE (MEBDW) SYSTEMS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034316532     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1320798     Document Type: Article

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