Low energy focused ion beam milling of silicon and germanium nanostructures

Nanotechnology

Volumn 22, Issue 10, 2011, Pages

  Kolíbal, Miroslav ^a   Matlocha, Tomáš ^a   Vystavěl, Tomáš ^b   Šikola, Tomáš ^a  

^a BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

^b Thermo Fisher Scientific   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM DAMAGE; FOCUSED ION BEAM MILLING; GERMANIUM NANOSTRUCTURES; ION CHANNELLING; LOW ENERGIES; LOW ENERGY IONS; PHYSICAL EFFECTS; REDEPOSITION; SCANNING PARAMETERS;

BEAM PLASMA INTERACTIONS; FOCUSED ION BEAMS; GERMANIUM; ION BOMBARDMENT; MILLING (MACHINING); NANOSTRUCTURES;

IONS;

EID: 79751516348     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/10/105304     Document Type: Article

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