The out of beam sight effects in focused ion beam processing

Nanotechnology

Volumn 20, Issue 27, 2009, Pages

  Tripathi, Sarvesh K ^a   Shukla, Neeraj ^a   Rajput, Nitul S ^a   Kulkarni, Vishwas N ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT PADS; DELETERIOUS EFFECTS; ELECTRICAL CHARACTERIZATION; FOCUSED ION BEAM CHEMICAL VAPOR DEPOSITION; GAS MOLECULES; INCIDENT BEAMS; ION BEAM PROCESSING; ION BEAM SCANNING; NANO-DEVICES; NANOCONTACTS;

FOCUSED ION BEAMS; IONS; MIM DEVICES;

CHEMICAL VAPOR DEPOSITION;

GALLIUM; ION; NANOMATERIAL;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; ELECTRIC CONDUCTIVITY; ELECTRON MICROSCOPY; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY;

EID: 67649306852     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/27/275301     Document Type: Article

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