Nanoimprint lithography stamp modification utilizing focused ion beams

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2679-2685

  Wanzenboeck, Heinz D ^a   Waid, Simon ^a   Bertagnolli, Emmerich ^a   Muehlberger, Michael ^b   Bergmair, Iris ^b   Schoeftner, Rainer ^b  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b PROFACTOR GMBH   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

FIB MILLING; FOCUSED ION BEAM TECHNOLOGY; HIGH-THROUGHPUT TECHNIQUE; ION MILLING; LINE PATTERN; LOW COSTS; NANO SCALE; REPAIR STRATEGY; REPAIR TECHNOLOGY; SUBMICROMETERS; ULTRA-THIN;

FOCUSED ION BEAMS; IONS; MILLING (MACHINING); REUSABILITY; THREE DIMENSIONAL; YTTERBIUM COMPOUNDS;

NANOIMPRINT LITHOGRAPHY;

EID: 72849145553     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3265461     Document Type: Conference Paper

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